The 2025 International Plasma Technology Joint Conference (IPTJC2025) was held from June 25 to 28, 2025, at the Innovation Building of Ming Chi University of Technology (MCUT) in New Taipei City. Organized by the Center for Plasma and Thin Film Technologies and co-organized by the Department of Materials Engineering, as well as the Center for Low-temperature Plasma Sciences, Nagoya University (Japan) and GREMI, Orléans University (France), the conference was endorsed by the American Vacuum Society (AVS) and sponsored by the National Science and Technology Council (NSTC), Taiwan.

This prestigious conference combined three renowned international conferences: the Global Plasma Forum (Japan), the International Workshop on Plasma Cryo Etching Processes (PlaCEP, Europe), and the International Forum in Plasma and Thin Film Technologies for Sustainable Development Goals (PTSDG, Taiwan). It attracted over 380 scholars, researchers, and industry representatives from 18 countries, making it one of the largest international academic events in Taiwan’s plasma and thin film technology field in recent years.

Key Themes and Academic Program

IPTJC2025 comprised three major symposia and one short course, as follows:

A. Cryogenic Plasma and Low-Temperature Etching Technology

B. Plasma Technology Applications.

C.Thin film and coating technology for sustainable development goals

A total of 265 abstracts were submitted, covering a wide range of topics from fundamental theories to industrial applications. The program included 3 Plenary Sessions, 10 Keynote Sessions, over 30 invited talks, and numerous Regular Oral and Poster presentations, fully demonstrating Taiwan’s innovation and international competitiveness in plasma and thin film research. The Plenary Speakers included Prof. Johanna Rosen from Linköping University, Sweden; Prof. Mark Kushner from the University of Michigan, USA; and Prof. Eun Ha Choi from Kwangwoon University, Korea, whose presentations addressed frontier topics such as materials synthesis, plasma modeling, and applications, attracting large audiences and lively discussions. The Keynote and Invited Speakers came from internationally renowned academic and research institutions in Japan, Taiwan, the Philippines, and France, presenting important advances in plasma reaction mechanisms, coating processes, materials simulation, and energy conversion technologies, offering highly inspiring content.

In addition, the conference featured student oral and poster competitions, providing young scholars with a platform to showcase their research achievements and receive professional feedback. Two Short Courses were also offered, focusing on HiPIMS and plasma simulation analysis, attracting 71 participants.

On the industry–academia interaction front, the conference set up exhibition booths with the participation of leading companies such as Lam Research and Applied Materials. During the event, preliminary discussions were also held with MCUT and research institutes on future technological collaborations and international project proposals.

Overall, the conference achieved remarkable results in academic dissemination, industry–academia collaboration, and technical education. It firmly established MCUT’s international leadership in the field of plasma and thin film technologies, while further enhancing Taiwan’s visibility and influence in the application of sustainable development technologies.

Source: Center for Plasma and Thin Film Technologies